Method and apparatus for multi-beam exposure

Details Method and apparatus for multi-beam exposure Method and apparatus for multi-beam exposure

2011-01-11

2011-01-11

Pham, Hai C (Department: 2861)

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

C347S255000

Reexamination Certificate

active

07868909

ABSTRACT:
A multi-beam exposure apparatus of the present invention includes a two-dimensional light modulator which is configured to project plural exposure beam spots onto an exposure surface, the plural exposure beam spots being arranged in parallel with the scanning direction while two-dimensionally arrayed; and a pixel block shifting member which divides the plural beam spots into plural blocks in the scanning direction and projects the plural exposure beam spots onto the exposure surface by shifting a relative position between the blocks in a direction orthogonal to a scanning direction, and thereby the scan-exposing of a space between the exposure beam spots in the direction orthogonal to the scanning direction is performed with the exposure beam spot of another block. According to the multi-beam exposure apparatus, the number of dots which can simultaneously be exposed in the direction orthogonal to the scanning direction can be increased.

REFERENCES:
patent: 6124876 (2000-09-01), Sunagawa
patent: 6486938 (2002-11-01), Morita et al.
patent: 2003/0169467 (2003-09-01), Miyagawa
patent: 2003/0219189 (2003-11-01), Ishikawa et al.
patent: 2004/0184119 (2004-09-01), Nakaya et al.
patent: 1369731 (2003-12-01), None
patent: 1376194 (2004-01-01), None
patent: 2004-233718 (2004-08-01), None

Affiliated with

Also associated with

Rating

Method and apparatus for multi-beam exposure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for multi-beam exposure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for multi-beam exposure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2642237