Method and apparatus for monolayer deposition (MLD)

Details Method and apparatus for monolayer deposition (MLD) Method and apparatus for monolayer deposition (MLD)

2005-01-26

2010-11-23

Cleveland, Michael (Department: 1712)

Coating processes

Coating by vapor, gas, or smoke

Mixture of vapors or gases utilized

C427S255230, C427S255700, C427S255600, C427S248100

Reexamination Certificate

active

07838072

ABSTRACT:
An adaptive real time thermal processing system is presented that includes a multivariable controller. The method includes creating a dynamic model of the MLD processing system and incorporating virtual sensors in the dynamic model. The method includes using process recipes comprising intelligent set points, dynamic models, and/or virtual sensors.

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