Method and apparatus for monitoring thermal processing of a work

Details Method and apparatus for monitoring thermal processing of a work Method and apparatus for monitoring thermal processing of a work

1995-11-27

1997-12-02

Karlsen, Ernest F.

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

324662, 324667, 21912402, 340584, 374184, G01R 2726, B23K 2600

Patent

active

056940467

ABSTRACT:
A method and apparatus for monitoring thermal processing of a workpiece using a sensor electrode which can be positioned relative to the workpiece and to which an alternating electric signal is applied in order to determine a measured capacitance (C.sub.meas) present between the sensor electrode and workpiece by evaluating a change in the alternating signal as a consequence of the measured capacitance (C.sub.meas). A measured capacitance frequency distribution is formed from a number of determined measured capacitances (C.sub.meas). The measured distribution is compared with a reference distribution. If a deviation is present between the two distributions, process parameters can be appropriately readjusted. It is preferable to use a laser beam for processing the workpiece.

REFERENCES:
patent: 3864626 (1975-02-01), MacLean et al.
patent: 4682004 (1987-07-01), Schmall
patent: 4769594 (1988-09-01), Darius et al.
patent: 4950084 (1990-08-01), Bailleul et al.
patent: 5101165 (1992-03-01), Rickards
patent: 5218311 (1993-06-01), Jagiella et al.
patent: 5340962 (1994-08-01), Schmidt et al.
W. Gatzweiler, et al. "Messung von Plasmadichtefluktuation. . ."; Laser und Optoelektronick 20 (5) ; (1988), pp. 64-69, month unavailable.
L. LI, et al. "Laser Weld Quality. . ."; International Conf.; (Nov. 1990), pp. 1-14.
A. Topkaya, et al. "Height Sensor Offers. . ."; Industrial Laser Review (Nov. 1983), pp. 17-18.

Affiliated with

Also associated with

Rating

Method and apparatus for monitoring thermal processing of a work does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for monitoring thermal processing of a work, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for monitoring thermal processing of a work will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-804707