Method and apparatus for monitoring the operation of a wafer...

Details Method and apparatus for monitoring the operation of a wafer... Method and apparatus for monitoring the operation of a wafer...

2005-03-22

2005-03-22

Black, Thomas G. (Department: 3661)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Robot control

C700S249000, C700S253000, C700S258000, C700S264000, C318S568110, C318S568240, C318S685000, C901S044000, C901S046000, C901S049000, C414S005000, C414S744300

Reexamination Certificate

active

06871115

ABSTRACT:
The integrity of control signals used to control a wafer handling robot is monitored by a monitor connected to various points of the robotic control system. The monitor includes a memory for storing data sets representing correct, reference characteristics of the control signals. The monitor samples control signals at various points in the control system and compares these sampled signals with the stored reference characteristics in order to determine whether a signal disparity exists. If a disparity exists, the monitor generates an error.

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