Method and apparatus for monitoring the condition of plasma...

Optics: measuring and testing – With plural diverse test or art

Reexamination Certificate

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C118S712000

Reexamination Certificate

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10484723

ABSTRACT:
An apparatus (100) senses a degree of cleanliness of a plasma reactor having a chamber (102) containing a plasma (103) that emits light (104) during a process conducted in the chamber (102). The apparatus (100) also has a light sensing element (180), configured to sense an intensity of the light (104) emitted by the plasma (103) after the light (104) passes through a film (135) that accrues in the chamber (102) during the process, and to provide a light intensity indication signal, and an electronics assembly (170) configured to receive the light intensity indication signal and to provide an indication of the degree of cleanliness of the plasma reactor.

REFERENCES:
patent: 5536359 (1996-07-01), Kawada et al.
patent: 5716878 (1998-02-01), Turner et al.
patent: 5759424 (1998-06-01), Imatake et al.
patent: 5948983 (1999-09-01), Gogol, Jr. et al.
patent: 5985032 (1999-11-01), Eriguch
patent: 6025916 (2000-02-01), Quick et al.
patent: 6146492 (2000-11-01), Cho et al.
patent: 6630364 (2003-10-01), Johnson
patent: 6750977 (2004-06-01), Otsubo et al.

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