Method and apparatus for monitoring surface layer growth

Details Method and apparatus for monitoring surface layer growth Method and apparatus for monitoring surface layer growth

1988-11-21

1990-07-31

Nelms, David C.

Radiant energy

Photocells; circuits and apparatus

Optical or pre-photocell system

356445, G01N 2186

Patent

active

049452541

ABSTRACT:
A method of monitoring surface layer growth using light scattered off a surface illuminated e.g. by a laser. A small area of a surface of a substrate is illuminated and the light scattered in a non-specular direction is detected during cleaning and subsequent layer growth. The amount of light scattered varies strongly with surface characteristics and gives clear indication of the end of oxide removal, initiation of nucleation and quality of growing layers. The monitoring is used during e.g. chemical vapor deposition, or e.g. molecular beam epitaxy growth processes.

REFERENCES:
patent: 2892490 (1959-06-01), Shakesby
patent: 3492491 (1970-01-01), Beeh
patent: 3700903 (1972-10-01), Adler
patent: 3853093 (1974-12-01), Baker et al.
patent: 4039370 (1977-08-01), Kleinknecht
patent: 4091060 (1978-03-01), Carter et al.
patent: 4142107 (1979-02-01), Harakis
patent: 4198261 (1980-04-01), Busta et al.
patent: 4201474 (1980-05-01), Holl
patent: 4332833 (1982-06-01), Aspnes et al.
patent: 4420826 (1983-12-01), Marshall, Jr. et al.

Affiliated with

Also associated with

Rating

Method and apparatus for monitoring surface layer growth does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for monitoring surface layer growth, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for monitoring surface layer growth will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1400013