Measuring and testing – Gas analysis – By vibration
Reexamination Certificate
2005-09-20
2005-09-20
Garber, Charles D (Department: 2856)
Measuring and testing
Gas analysis
By vibration
C073S031030, C073S579000
Reexamination Certificate
active
06945090
ABSTRACT:
A molecular contamination monitor for monitoring molecular contamination on a surface of a subject surface susceptible to degradation by a molecular contaminant. The monitor includes a surface acoustic wave (SAW) device having a SAW measurement surface coated with a material that is equivalent to the subject material with respect to spontaneous contamination by a contaminant. In the preferred embodiment, the coating comprises the same material as the subject surface or a material that interacts chemically with the contaminant in an equivalent manner to the subject surface. Exemplary coatings include: photoresist, copper, silver, gold, platinum, titanium, tungsten, aluminum, nickel, metal oxides, stearic acid, silicon, gallium arsenide, gallium nitride, germanium, silicon germanium, silicon dioxide, silicon nitride, and glass. Exemplary coating methods include sputtering, CVD, ALD and misted deposition.
REFERENCES:
patent: 3253219 (1966-05-01), Littler
patent: 5321331 (1994-06-01), Baer et al.
patent: 5627749 (1997-05-01), Waterman et al.
patent: 5795993 (1998-08-01), Pfeifer et al.
patent: 5856198 (1999-01-01), Joffe et al.
patent: 5859537 (1999-01-01), Davis et al.
patent: 5918258 (1999-06-01), Bowers
patent: 6079252 (2000-06-01), Tabler et al.
patent: 6122954 (2000-09-01), Bowers
patent: 6378370 (2002-04-01), Haskell et al.
patent: 6490927 (2002-12-01), Braunling et al.
Garber Charles D
Particle Measuring Systems, Inc.
Patton & Boggs LLP
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