Method and apparatus for monitoring lithographic exposure

Details Method and apparatus for monitoring lithographic exposure Method and apparatus for monitoring lithographic exposure

1994-12-20

1996-04-16

Pham, Hoa Q.

Optics: measuring and testing

Standard

G01J 102

Patent

active

055088031

ABSTRACT:
A lithographic mask with an exposure monitor for imaging a gray scale feature. The exposure monitor has abutting regions of differing optical density disposed on the mask for imaging the gray scale feature by taking advantage of diffraction effects. After calibrating gray scale feature size to critical feature size, a gray scale feature may be imaged to monitor critical feature size due to exposure.

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