Method and apparatus for monitoring charge neutralization operat

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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250251, H01J 37317

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active

059593059

ABSTRACT:
A charge neutralization monitor monitors the operation of a charge neutralization system for an ion implantation system. The charge neutralization system produces neutralizing electrons in a region through which an ion beam passes in treating one or more workpieces. The charge neutralization monitor applies a suitable voltage to a target electrode positioned to collect neutralizing electrons produced by the charge neutralization system. The charge neutralization monitor then determines the available neutralizing electron current that may be produced by the charge neutralization system by monitoring the current flowing through the target electrode.

REFERENCES:
patent: 4804837 (1989-02-01), Farley
patent: 4914292 (1990-04-01), Tamai et al.
patent: 5089710 (1992-02-01), Kikuchi et al.
patent: 5148034 (1992-09-01), Koike
patent: 5164599 (1992-11-01), Benveniste
patent: 5343047 (1994-08-01), Ono et al.
patent: 5378899 (1995-01-01), Kimber
patent: 5399871 (1995-03-01), Ito et al.
patent: 5531420 (1996-07-01), Benveniste
patent: 5633506 (1997-05-01), Blake
patent: 5691537 (1997-11-01), Chen et al.
patent: 5703375 (1997-12-01), Chen et al.
Current, Michael I., et al., "Beam-plasma Concepts for Wafer Charging Control During Ion Implantation," Ion Implantation Technology, IEEE, pp. 53-56 (1997).
Dixon, William, et al., "Photoresist-Enhanced Wafer Charging During High Current Ion Implantation," Ion Implantation Technology, IEEE, pp. 85-88 (1997).
Heremans, Paul, et al., "Analysis of the Charge Pumping Technique and Its Application for the Evaluation of MOSFET Degradation," IEEE Transactions on Electron Devices, vol. 36, No. 7, pp. 1318-1335 (Jul. 1989).
Hutchinson, I.H., Principles of Plasma Diagnostics, Cambridge University Press, 9 sheets containing copies of the first 18 pages of Chapter 3 which is titled "Plasma particle flux" (1987).
Mack, M.E., et al., "Progress in Wafer Charging and Charge Neutralization," Nuclear Instruments and Methods in Physics Research, vol. B74, pp. 287-290 (1993).

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