Data processing: measuring – calibrating – or testing – Measurement system – Remote supervisory monitoring
Reexamination Certificate
2005-05-24
2005-05-24
Wachsman, Hal (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system
Remote supervisory monitoring
C702S130000, C702S127000, C156S345240, C438S014000
Reexamination Certificate
active
06898558
ABSTRACT:
The present invention presents an apparatus and method for monitoring a material processing system, wherein the material processing system includes a processing tool, a number of RF-responsive process sensors coupled to the processing tool to generate and transmit process data, and a sensor interface assembly (SIA) configured to receive the process data from the plurality of RF-responsive process sensors.
REFERENCES:
patent: 6244121 (2001-06-01), Hunter
patent: 6455437 (2002-09-01), Davidow et al.
patent: 6617963 (2003-09-01), Watters et al.
patent: 6668618 (2003-12-01), Larson et al.
patent: 20030032207 (2003-02-01), Rengarajan et al.
patent: 20030082835 (2003-05-01), McChesney et al.
patent: 20030201069 (2003-10-01), Johnson
patent: 20030231566 (2003-12-01), Smith et al.
patent: 20040007326 (2004-01-01), Roche et al.
patent: 20040029299 (2004-02-01), Pasadyn et al.
Tokyo Electron Limited
Wachsman Hal
LandOfFree
Method and apparatus for monitoring a material processing... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for monitoring a material processing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for monitoring a material processing... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3426142