Coating apparatus – With treatment of coating material – By agitation
Reexamination Certificate
2009-11-13
2011-11-22
Davis, Robert B (Department: 1743)
Coating apparatus
With treatment of coating material
By agitation
C222S146100, C222S526000, C222S572000, C366S184000
Reexamination Certificate
active
08062424
ABSTRACT:
A method for encapsulating a substrate includes placing a hardened encapsulant material in a container. The encapsulant material is then heated and stirred until it is in a liquid or gel state. The liquid encapsulant material is held in the container in a vacuum state and dispensed over semiconductor dies along a guide, which allows the liquid encapsulant material to cool slightly before it covers a die.
REFERENCES:
patent: 1989800 (1935-02-01), Gustin
patent: 3239199 (1966-03-01), Jameson
patent: 3253303 (1966-05-01), Bradt
patent: 3291672 (1966-12-01), Sonneborn et al.
patent: 3412431 (1968-11-01), Lemelson
patent: 3717121 (1973-02-01), Bruckbauer et al.
patent: 5100699 (1992-03-01), Roeser
patent: 6527430 (2003-03-01), Osborn
Low Boon Yew
Manikam Vermal Raja
Manikam Vittal Raja
Bergene Charles
Davis Robert B
Freescale Semiconductor Inc.
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