Method and apparatus for modifying a ribbon-shaped ion beam

Details Method and apparatus for modifying a ribbon-shaped ion beam Method and apparatus for modifying a ribbon-shaped ion beam

2010-02-10

2011-11-15

Wells, Nikita (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S3960ML, C250S492210, C250S281000, C250S282000

Reexamination Certificate

active

08058626

ABSTRACT:
A ribbon-shaped ion beam having an elongate cross-section normal to a beam direction is modified by generating, at a predetermined position along the ribbon-shaped beam, a magnetic field extending in an x-direction along an x-axis. The x-direction magnetic field has a non-uniform intensity which is a desired function of x.

REFERENCES:
patent: 5350926 (1994-09-01), White et al.
patent: 5374564 (1994-12-01), Bruel
patent: 6169262 (2001-01-01), Lee et al.
patent: 7301156 (2007-11-01), Purser et al.
patent: 7888660 (2011-02-01), Purser et al.
patent: 2011/0114849 (2011-05-01), Sinclair et al.
patent: 2011/0114850 (2011-05-01), Purser et al.
Ziegler, J. F., ed., Ion Implementation-Science and Technology, Annapolis, MD: Ion Implantation Technology, Co., 2004, pp. ii, iv-vi, 1-1 to 1-43, 2-1 to 2-42, 3-1 to 3-30, 7-1 to 7-38, 8-1 to 8-40, 9-1 to 9-33, 11-0 to 11-28, 12-1 to 12-40, 13-1, 13-19 to 13-41, and 14-1 to 14-37.
Ziegler, J. F., ed., Ion Implementation-Science and Technology, Poughkeepsie, NY: Ion Implantation Technology, Co., 1996, pp. ii-v, 391-427, and 442-510.
Notice of Allowance dated Aug. 30, 2011 for U.S. Appl. No. 12/621,689.

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