Radiation imagery chemistry: process – composition – or product th – Effecting frontal radiation modification during exposure,... – Involving motion during exposure – e.g. – dodging – etc.
Patent
1995-03-15
1997-10-21
Angebranndt, Martin
Radiation imagery chemistry: process, composition, or product th
Effecting frontal radiation modification during exposure,...
Involving motion during exposure, e.g., dodging, etc.
205118, 205125, 378 34, 378 35, 378156, 378157, 430312, 430313, 430315, 430324, 430326, 430331, 430396, 430967, 430966, B23P 1700
Patent
active
056795025
ABSTRACT:
An X-ray source such as a synchrotron which provides a significant spectral content of hard X-rays is used to expose relatively thick photoresist such that the portions of the photoresist at an exit surface receive at least a threshold dose sufficient to render the photoresist susceptible to a developer, while the entrance surface of the photoresist receives an exposure which does not exceed a power limit at which destructive disruption of the photoresist would occur. The X-ray beam is spectrally shaped to substantially eliminate lower energy photons while allowing a substantial flux of higher energy photons to pass through to the photoresist target. Filters and the substrate of the X-ray mask may be used to spectrally shape the X-ray beam. Machining of photoresists such as polymethylmethacrylate to micron tolerances may be obtained to depths of several centimeters, and multiple targets may be exposed simultaneously. The photoresist target may be rotated and/or translated in the beam to form solids of rotation and other complex three-dimensional structures.
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Guckel Henry
Johnson Erik D.
Klein Jonathan L.
Siddons David Peter
Angebranndt Martin
Wisconsin Alumni Research Foundation
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