Method and apparatus for mechanical polishing

Details Method and apparatus for mechanical polishing Method and apparatus for mechanical polishing

1996-08-06

1998-11-10

Rose, Robert A.

Abrading

Abrading process

With tool treating or forming

451443, B24B 5300

Patent

active

058335196

ABSTRACT:
Method and apparatus for conditioning a polishing pad. In particular, a check loop system and associated code are described for monitoring force applied on a pad from an end effector attached to an arm. The pad is conditioned by the end effector for mechanical polishing to remove matter from a substrate assembly. This may be done with chemical-mechanical-polishing and is often used for planarization of a substrate assembly. Described are a modular turret and drive system which are used to manipulate an end effector over a pad.

REFERENCES:
patent: 5154021 (1992-10-01), Bombardier
patent: 5245794 (1993-09-01), Salugsugan
patent: 5299393 (1994-04-01), Chandler et al.
patent: 5384986 (1995-01-01), Hirose et al.
patent: 5399234 (1995-03-01), Yu et al.
patent: 5413941 (1995-05-01), Koos et al.
patent: 5456627 (1995-10-01), Jackson et al.
patent: 5486131 (1996-01-01), Cesna et al.
patent: 5531635 (1996-07-01), Mogi et al.

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