Method and apparatus for mechanical planarization and endpoint d

Abrasive tool making process – material – or composition – With carbohydrate or reaction product thereof

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

51281SF, 51283R, 36447406, B24B 4900

Patent

active

RE0344257

ABSTRACT:
A method and apparatus for mechanical planarization and endpoint detection of a semiconductor wafer or the like. The apparatus includes a polishing head for rotating the wafer under a controlled pressure against a rotating polishing platen. The polishing head is mounted such that the wafer can be moved across the polishing platen to overhang a peripheral edge of the polishing platen and expose the surface of the wafer. Endpoint detection apparatus in the form of a laser interferometer measuring device is directed at an unpatterned die on the exposed surface of the wafer to detect oxide thickness at that point. The laser light beam is enclosed in a column of liquid to clean the wafer surface at the point of detection and to provide a uniform reference medium for the laser light beam.

REFERENCES:
patent: 3156073 (1964-11-01), Strasbaugh
patent: 3564776 (1971-02-01), Aspden
patent: 3841031 (1974-10-01), Walsh
patent: 4083272 (1978-04-01), Miller
patent: 4193226 (1980-03-01), Gill, Jr. et al.
patent: 4365301 (1982-12-01), Arnold et al.
patent: 4811522 (1989-03-01), Gill, Jr.
patent: 4930262 (1990-06-01), Sennewald

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for mechanical planarization and endpoint d does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for mechanical planarization and endpoint d, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for mechanical planarization and endpoint d will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1750414

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.