Optics: measuring and testing – By alignment in lateral direction – With registration indicia
Reexamination Certificate
2004-11-03
2009-12-15
Chowdhury, Tarifur (Department: 2886)
Optics: measuring and testing
By alignment in lateral direction
With registration indicia
C257S797000
Reexamination Certificate
active
07633618
ABSTRACT:
The invention relates to a method for measuring the relative position of a first and a second alignment mark on a substrate. The first alignment mark comprises a periodic structure having a first portion with a first periodicity (PE1) and an adjacent second portion with a second periodicity (PE2). The second alignment mark (11) comprises a periodic structure having a first portion with the second periodicity (PE2) and an adjacent second portion with the first periodicity (PE1). The first and second alignment marks are arranged such that the first portions are substantially located one over the other and the second portions are substantially located one over the other. The method further comprises generating a Moiré pattern from the alignment marks and determining the relative positions of the first and second alignment marks based on the periodicity of the Moiré pattern.
REFERENCES:
patent: 6766211 (2004-07-01), Ausschnitt
patent: 2002/0080364 (2002-06-01), Monshouwer et al.
patent: 2004/0246482 (2004-12-01), Sezginer et al.
patent: WO97/45773 (1997-12-01), None
Zaidi et al., “Moiré interferometric alignment and overlay techniques,” Proceedings of the SPIE 2196:371-382 (1994).
ASML Netherlands B.V.
Chowdhury Tarifur
Lapage Michael
Pillsbury Winthrop Shaw & Pittman LLP
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