Method and apparatus for measuring the relative position of...

Details Method and apparatus for measuring the relative position of... Method and apparatus for measuring the relative position of...

2004-11-03

2009-12-15

Chowdhury, Tarifur (Department: 2886)

Optics: measuring and testing

By alignment in lateral direction

With registration indicia

C257S797000

Reexamination Certificate

active

07633618

ABSTRACT:
The invention relates to a method for measuring the relative position of a first and a second alignment mark on a substrate. The first alignment mark comprises a periodic structure having a first portion with a first periodicity (PE1) and an adjacent second portion with a second periodicity (PE2). The second alignment mark (11) comprises a periodic structure having a first portion with the second periodicity (PE2) and an adjacent second portion with the first periodicity (PE1). The first and second alignment marks are arranged such that the first portions are substantially located one over the other and the second portions are substantially located one over the other. The method further comprises generating a Moiré pattern from the alignment marks and determining the relative positions of the first and second alignment marks based on the periodicity of the Moiré pattern.

REFERENCES:
patent: 6766211 (2004-07-01), Ausschnitt
patent: 2002/0080364 (2002-06-01), Monshouwer et al.
patent: 2004/0246482 (2004-12-01), Sezginer et al.
patent: WO97/45773 (1997-12-01), None
Zaidi et al., “Moiré interferometric alignment and overlay techniques,” Proceedings of the SPIE 2196:371-382 (1994).

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