Thermal measuring and testing – Emissivity determination
Patent
1991-09-13
1992-11-24
Yasich, Daniel M.
Thermal measuring and testing
Emissivity determination
364557, 364581, 374126, G01J 508, G01K 310
Patent
active
051657910
ABSTRACT:
A method of using infrared light for measuring the temperature of a semiconductor element with a surface layer formed by two kinds of materials that have different emissivities and optical reflectances is disclosed. The method includes the step of taking an image with diffused light reflected from the surface of a semiconductor element by an image taking device. The method further includes determining the area ratio with which each of the two kinds of materials occupy the surface of the semiconductor element by comparing the average brightness value of the image by the image taking device with the brightness value of an image wherein each of the materials independently forms the surface layer of the above semiconductor element, obtaining a weighted average of the emissivities of the materials with the area ratio at which each of the materials occupies on the surface of the semiconductor element, and calculating the temperature of the semiconductor element based on the weighted average and the actual amount of infrared emission.
REFERENCES:
patent: 4797840 (1989-01-01), Fraden
patent: 4881823 (1989-11-01), Tanaka et al.
patent: 4919542 (1990-04-01), Nulman et al.
patent: 4926364 (1990-05-01), Brotherton
patent: 4979134 (1990-12-01), Arima et al.
Miki Atsushi
Nishiguchi Masanori
Sumitomo Electric Industries Ltd.
Yasich Daniel M.
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