Optics: measuring and testing – Inspection of flaws or impurities – Transparent or translucent material
Reexamination Certificate
2005-06-21
2005-06-21
Rosenberger, Richard A. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Transparent or translucent material
Reexamination Certificate
active
06909502
ABSTRACT:
An apparatus and method for quantitatively measuring ripple and distortion levels in a transparent sheet (or film) material is provided. The apparatus includes a light source for projecting light beams onto a screen. A frame assembly is positioned intermediate to the light source and is adapted to hold the transparent sheet material at a predetermined angle and distance from the screen. The light beams pass though the transparent sheet material and projects an image onto the screen. The process includes digitally capturing the image and generating parameter signals from the digital image. The parameter signals are used in a model to quantitatively assign a value to the level of ripple and distortion present in the transparent sheet material.
REFERENCES:
patent: 4310242 (1982-01-01), Genco et al.
patent: 5146282 (1992-09-01), Guering et al.
patent: 5175030 (1992-12-01), Lu et al.
patent: 5183597 (1993-02-01), Lu
patent: 5271968 (1993-12-01), Coyle et al.
patent: 5468542 (1995-11-01), Crouch
patent: 5626800 (1997-05-01), Williams et al.
patent: 5691811 (1997-11-01), Kihira
patent: 5694479 (1997-12-01), Guering et al.
patent: 5726749 (1998-03-01), Schave
patent: 5812260 (1998-09-01), Louisnathan
patent: 5880843 (1999-03-01), Hermosillo-Valadez et al.
patent: 6011620 (2000-01-01), Sites et al.
patent: 6208412 (2001-03-01), Ladewski
patent: 6275286 (2001-08-01), Hawbold et al.
patent: 6280063 (2001-08-01), Fong et al.
patent: 2003/0108710 (2003-06-01), Coyle et al.
Residual Stress Testing for Transparent Polymers (MDDI archive, Mar. 99)—Alex S. Redner and Barbara Hoffman.
Japanese Patent No. JP2002148142; Publication Date: May 22, 2002; Abstract Only; 1 page.
Japanese Patent No. JP2002365221; Publication Date: Dec. 18, 2002; Abstract Only; 1 page.
ARICHIVES, Nov. 2000, http://www.lasor.com/archives.htm; 7 pages.
Capaldo Kevin
Tadros Safwat
Vickers Charles
General Electric
Rosenberger Richard A.
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