Method and apparatus for measuring relative dielectric constant

Details Method and apparatus for measuring relative dielectric constant Method and apparatus for measuring relative dielectric constant

2008-05-20

2008-05-20

Hirshfeld, Andrew H (Department: 2858)

Electricity: measuring and testing

Impedance, admittance or other quantities representative of...

Lumped type parameters

C324S662000

Reexamination Certificate

active

07375537

ABSTRACT:
A relative-dielectric-constant measuring apparatus according to the present invention includes an ellipsometer and a capacitance measuring part. The ellipsometer allows non-contact measurements of the film thickness and optical constants of an insulation film formed on the upper surface of a wafer. The capacitance measuring part, on the other hand, allows non-contact measurements of the gap between the insulation film and an electrode and accumulation capacitance. The relative-dielectric-constant measuring apparatus can calculate the relative dielectric constant of the insulation film based on the measured film thickness, gap, and accumulation capacitance. Thus, the relative dielectric constant of the insulation film can be determined without contact and with high precision.

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Miller, Tom, G. “A New Approach for Measuring Oxide Thickness.” Semiconductor International, Jul. 1995, pp. 147-148.

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