Method and apparatus for measuring positional deviation while co

Details Method and apparatus for measuring positional deviation while co Method and apparatus for measuring positional deviation while co

1994-09-28

1996-12-17

Gonzalez, Frank

Optics: measuring and testing

By polarized light examination

With birefringent element

356349, 356401, 356356, 250548, G01B 902

Patent

active

055859232

ABSTRACT:
A method and apparatus for measuring the relative positional deviation between first and second diffraction gratings formed on an object includes determining the relative positional deviation of the first and second diffraction gratings while detecting and correcting an error produced in relation to detection of the positional deviation of the first and second diffraction gratings.

REFERENCES:
patent: 4710026 (1987-12-01), Magome et al.
patent: 4804270 (1989-02-01), Miller et al.
patent: 5000573 (1991-03-01), Suzuki et al.
patent: 5114236 (1992-05-01), Matsugu et al.
patent: 5142156 (1992-08-01), Ozawa et al.
patent: 5182610 (1993-01-01), Shibata
patent: 5182615 (1993-01-01), Korosawa et al.
patent: 5196711 (1993-03-01), Matsuga et al.
patent: 5200800 (1993-04-01), Suda et al.
patent: 5235408 (1993-08-01), Matsugu et al.
patent: 5243195 (1993-09-01), Nishi
patent: 5285259 (1994-02-01), Saitoh
patent: 5333050 (1994-07-01), Nose et al.
patent: 5347356 (1994-09-01), Ota et al.

Affiliated with

Also associated with

Rating

Method and apparatus for measuring positional deviation while co does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for measuring positional deviation while co, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for measuring positional deviation while co will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1996105