Method and apparatus for measuring non-linearity of a pattern ed

Radiant energy – Photocells; circuits and apparatus – Photocell controlled circuit

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250563, 382 67, G06K 903

Patent

active

047437685

ABSTRACT:
A method of measuring non-linearity of a pattern edge of a pattern formed on a metal plate such as a glass plate and an apparatus for measuring the same are disclosed. With this novel pattern edge measurement system, first is to dispose a pattern to be measured so that a photosensitive picture element column in a light-receiving unit is substantially in parallel with a pattern edge of an image of the pattern to effect a relative movement of the light-receiving unit or the image of the pattern so that light-receiving unit traverses the pattern edge. Next is to memorize a signal indicative of a light received by the photosensitive picture element column every predetermined moving distances of the light-receiving unit or the pattern to determine a pattern edge position per each photosensitive picture element by making use of the received light signal. Then, a non-linearity of the pattern is computed on the basis of each pattern edge position. Thus, the novel pattern edge measuring system makes it possible to quantitatively measure a non-linearity of a pattern edge with high precision.

REFERENCES:
patent: 4435834 (1984-03-01), Pauli et al.
patent: 4598419 (1986-07-01), Mignot et al.

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