Method and apparatus for measuring metallic impurities contained

Details Method and apparatus for measuring metallic impurities contained Method and apparatus for measuring metallic impurities contained

1997-11-05

2000-01-11

Brock, Michael

Measuring and testing

Gas analysis

By vibration

73 2403, 73 2406, 73 2804, 378 47, 378 48, G01N 23223

Patent

active

060123257

ABSTRACT:
A method and apparatus for measuring metallic impurities within a fluid by X-ray fluorescence in which a sample stream flowing at a constant flow rate is passed through a microporous filter. The microporous filter contains substantially no metallic impurities and is configured to adsorb the particulate solid phase and vapor phase of the compounds. Excitation of the metallic compounds by X-ray produces an X-ray florescence having an intensity that can be measured. The change in intensity is compared with that produced by a calibrated inflow of a standard gas sample to derive the impurity concentration. In a preferred embodiment, the filter is housed within a chamber having a window that is preferably fabricated from Beryllium so as not to appreciably attenuate the X-rays.

REFERENCES:
patent: H188 (1987-01-01), Thomson et al.
patent: 3443092 (1969-05-01), Carr-Brion et al.
patent: 4544386 (1985-10-01), Trayford, III et al.
patent: 5014287 (1991-05-01), Thornton et al.
patent: 5563929 (1996-10-01), Connolly et al.

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