Method and apparatus for measuring film thickness and film...

Measuring and testing – Vibration – Resonance – frequency – or amplitude study

Reexamination Certificate

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C073S024060, C073S580000, C427S009000

Reexamination Certificate

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11255781

ABSTRACT:
A device for measuring thickness and/or rate of thickness increase of a film comprises at least one piezoelectric element, and first and second electrodes in contact with the piezoelectric element. A method of measuring thickness and/or rate of thickness increase of a film comprises applying a voltage across a piezoelectric element from a first electrode to a second electrode, thereby causing the piezoelectric element to vibrate, and measuring the rate of vibration of the piezoelectric element. Heat may be applied to the piezoelectric element. The piezoelectric element may be formed of quartz crystal, e.g., IT-cut or near-IT-cut.

REFERENCES:
patent: 2743144 (1956-04-01), Bottom et al.
patent: 4561286 (1985-12-01), Sekler et al.
patent: 6247354 (2001-06-01), Vig et al.
patent: 6260408 (2001-07-01), Vig et al.
patent: 6294964 (2001-09-01), Satoh
patent: 6370955 (2002-04-01), Tuller et al.
patent: 6859110 (2005-02-01), Satoh
patent: 58-223009 (1983-12-01), None
patent: 03-120409 (1991-05-01), None
patent: 135019 (1972-08-01), None
Krempl, P., Schleinzer, G., Wallnöfer, W., “Gallium phosphate, GaPO4: a new piezoelectric crystal material for high-temperature sensorics,” Sensors and Actuators A61, 1997, pp. 361-363.
Mecea, V.M., Carrisson, J.O., Heszlert, P., Bârtan, “Development and testing of a high temperature quartz crystal microbalance,” Pergamon, 1995, Vacuum/vol. 46/No. 7, pp. 691-694.
Schmitt et al., “Bulk acoustic wave modes in quartz for sensing measurand-induced mechanical and electrical property changes”, Sensors and Actuators B, vol. 76, 2001, pp. 95-102.

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