Method and apparatus for measuring electron beam effective focus

Details Method and apparatus for measuring electron beam effective focus Method and apparatus for measuring electron beam effective focus

1995-11-30

1998-03-10

Teska, Kevin J.

Boots, shoes, and leggings

2504921, 25049222, 25049223, 2504923, C23C 1400, H01J 4314, G21K 108

Patent

active

057269190

ABSTRACT:
A method and apparatus are provided for measuring effective focus of an electron beam directed at a target. The electron beam imparts heat flux into the target to effect a target surface temperature profile thereon. A mathematical process model is used to predict an initial iteration of the temperature profile based on operating beam parameters and based on heat transfer behavioral relationships of the target. The temperature profile is optically measured and then compared with the initial iteration to obtain a residual error therebetween. The predicted temperature profile is iterated by varying the beam focus operating parameter until the residual error is less than a predetermined value for determining the effective beam focus.

REFERENCES:
patent: 4654506 (1987-03-01), Sakamoto et al.
patent: 4656331 (1987-04-01), Lillquist et al.
patent: 4783169 (1988-11-01), Matthews et al.
patent: 4801977 (1989-01-01), Ishitaka et al.
patent: 5019961 (1991-05-01), Addesso et al.
patent: 5273102 (1993-12-01), Lillquist et al.
patent: 5307683 (1994-05-01), Phelps et al.
patent: 5483036 (1996-01-01), Giedt et al.
patent: 5486995 (1996-01-01), Kist et al.
Laflamme et al., "Diagnostic Device Quantifies, Defines Geometric Characteristics of Electron Beam", Welding Journal, Oct. 1991, pp. 33-40.

Affiliated with

Also associated with

Rating

Method and apparatus for measuring electron beam effective focus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for measuring electron beam effective focus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for measuring electron beam effective focus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-145278