X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1992-04-21
1992-11-24
Hannaher, Constantine
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 70, 378 86, 378 54, 378 55, 250269, 250266, 250308, G01B 1502
Patent
active
051669641
ABSTRACT:
A distance between a radiation source and a detector is first set to a first distance and the number of pulses of a .gamma.-ray is detected. Then, the distance between the radiation source and the detector is set to a second distance different from the first distance and the number of .gamma.-ray pulses is detected. A density .rho. of a sample is finally calculated on the basis of a ratio of the two detection pulse numbers which were detected. The radiation source is set on the surface of the sample or in the sample. The sample detector is set on the sample surface. Fundamentally, one radiation source and two detectors are used. In the case of using one radiation source and one detector, either one of them is moved and the number of pulses is detected twice.
REFERENCES:
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patent: 4277681 (1981-07-01), Borken
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patent: 4641030 (1987-02-01), Reigmand
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Akifuji Kenji
Furukawa Jun
Hasegawa Kenichi
Kimura Setsuro
Watanabe Kuniyoshi
Chu Kim-Kwok
Hannaher Constantine
Kenichi Hasegawa & Tokimec Inc.
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