Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Chemical analysis
Reexamination Certificate
2006-02-07
2006-02-07
Tsai, Carol S. W. (Department: 2857)
Data processing: measuring, calibrating, or testing
Measurement system in a specific environment
Chemical analysis
C702S130000, C702S136000, C702S138000, C702S182000, C134S019000, C134S107000, C134S108000
Reexamination Certificate
active
06996479
ABSTRACT:
An apparatus for measuring the water content of a water-containing liquid mixture contained in a tight chemistry tank includes a heating device for controlling the temperature of the liquid mixture to a temperature near the boiling point of the liquid mixture, a cooling medium system disposed at the top of the tight chemistry tank having a cooling medium inlet and a cooling medium outlet, a temperature measurement system for determining the temperature difference between the cooling medium inlet and outlet, and a computing device for calculating the water content of the liquid mixture from the temperature difference. Also provided is a tank for supplying water to the liquid mixture, and a control system for adjusting the amount of water supplied from the tank based upon the water content measured by the measuring apparatus. Also provided is a method for measure the water content.
REFERENCES:
patent: 4766553 (1988-08-01), Kaya et al.
patent: 4852524 (1989-08-01), Cohen
patent: 5078832 (1992-01-01), Tanaka
patent: 5143103 (1992-09-01), Basso et al.
patent: 5151190 (1992-09-01), Seiryo
patent: 5213725 (1993-05-01), Lee et al.
patent: 5365960 (1994-11-01), Bran
patent: 5390632 (1995-02-01), Ikebe et al.
patent: 5585729 (1996-12-01), Toshima et al.
patent: 5681448 (1997-10-01), Uchiyama et al.
patent: 5779927 (1998-07-01), Lo
patent: 5782080 (1998-07-01), Illbruck
patent: 5938885 (1999-08-01), Huang et al.
patent: 6110274 (2000-08-01), Okuno
patent: 6152209 (2000-11-01), Pleschiutschnigg
patent: 6221167 (2001-04-01), Karasawa
patent: 6445880 (2002-09-01), Hollander et al.
patent: 6463748 (2002-10-01), Benedict et al.
patent: 6470144 (2002-10-01), Tarutani et al.
patent: 6678628 (2004-01-01), Ryan et al.
patent: 195 48 115 (1996-07-01), None
patent: 0 474 482 (1992-03-01), None
patent: 0 508 212 (1992-10-01), None
patent: 0 703 604 (1996-03-01), None
patent: 62-272542 (1987-11-01), None
patent: 08296797 (1996-11-01), None
Van Gelder, W. et al.: “The Etching of Silicon Nitride in Phosphoric Acid with Silicon Dioxide as a Mask”, Journal Electrochemical Society, vol. 144, No. 8, Aug. 1967, pp. 869-872.
Ottow Stefan
Welzel Martin
Wissel Dan
Infineon - Technologies AG
Infineon Technologies SC300 GmbH & Co. KG
Motorola Inc.
Tsai Carol S. W.
LandOfFree
Method and apparatus for measuring and controlling the water... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for measuring and controlling the water..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for measuring and controlling the water... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3684883