Method and apparatus for measuring alignment of layers in...

Optics: measuring and testing – Position or displacement – Position transverse to viewing axis

Reexamination Certificate

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C356S401000, C356S508000

Reexamination Certificate

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07349105

ABSTRACT:
According to a first embodiment of the invention, a first and second reticle are used to form layers using a photolithographic process. The first and second reticles each include a grating positioned so that when the reticles are printed, the two gratings will at least partially overlap each other. The two gratings produce an interference pattern, which is used to measure overlay error.

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