Optics: measuring and testing – Position or displacement – Position transverse to viewing axis
Reexamination Certificate
2008-03-25
2008-03-25
Lauchman, Layla G. (Department: 2877)
Optics: measuring and testing
Position or displacement
Position transverse to viewing axis
C356S401000, C356S508000
Reexamination Certificate
active
07349105
ABSTRACT:
According to a first embodiment of the invention, a first and second reticle are used to form layers using a photolithographic process. The first and second reticles each include a grating positioned so that when the reticles are printed, the two gratings will at least partially overlap each other. The two gratings produce an interference pattern, which is used to measure overlay error.
REFERENCES:
patent: 5216257 (1993-06-01), Brueck et al.
patent: 5414514 (1995-05-01), Smith et al.
patent: 5808742 (1998-09-01), Everett et al.
patent: 6061606 (2000-05-01), Ross
patent: 2002/0080364 (2002-06-01), Monshouwer et al.
Adel, Mike, et al. “Optimized Overlay Metrology Marks: Theory and Experiment”, IEEE Transactions on Semiconductor Manufacturing, vol. 17, No. 2, May 2004. pp. 166-179.
Amidror, Isaac, “The Fourier-spectrum of Circular Sine and Cosine Gratings With Arbitrary Radial Phases”, Apr. 1, 1998, Optics Communications 149 (1998), Elsevier Science B.V. pp. 127-134.
Glassner, Andrew, “Andrew Glassner's Notebook: Inside Moire Patterns”, IEEE Computer Graphics and Applications, Nov./Dec. 1997, pp. 97-101.
Huang, Hsu-Ting, et al., “Scatterometry—Based Overlay Metrology”, Metrology, Inspection, and Process Control for Microlithography Xvii, Proceedings of SPIE, vol. 5038 (2003). pp. 126-137.
Kanjilal, A.K., et al., “Automatic Mask Alignment Without A Microscope”, IMTC '94, May 10-12, Hamamatsu, THAM 1-9. pp. 849-852.
Liu, Jing-Nan, et al., “Precision Alignment of Pulse Stage Using Moire Signals”, SICE Aug. 5-7, 2002, Osaka SICE02-0583 MA16-5. pp. 382-385.
Liou, N.-S., et al., “Fourier Transform Moire Strain Analysis By Using Cross Gratings Produced From Iron-on Paper and Inkjet Printer”, Science Direct, Polymer Testing 22 (2003) 487-490. 2003 Published by Elsevier Science Ltd. pp. 487-490.
Nishihara, H. Keith, et al., “Measuring Photolithographic Overlay Accuracy and Critical Dimensions by Correlating Binarized Laplacian of Gaussian Convolutions”, IEEE Transactions on Pattern Analysis and Machine Intelligence, vol. 10, No. 1, Jan. 1988. pp. 17-30.
Patorski, K., et al., “Optical Alignment Using Fourier Imaging Phenomenon and Moire Technique”, Optics and Laser Technology, Apr. 1975. pp. 81-85.
Wang, Boxiong, et al., “Moire Deflectometry Based On Fourier—Transform Analysis”, Elsevier Science Ltd. 1999. Measurement 25 (1999) pp. 249-253.
Wang, Ming, “Fourier Transform Moire Tomography For High—Sensitivity Mapping Asymmetric 3—D Temperature Field”, 2002 Elsevier Science Ltd., Optics & Laser Technology 34 (2002) pp. 679-685.
Blakely , Sokoloff, Taylor & Zafman LLP
Intel Corporation
Lauchman Layla G.
Skovholt Jonathan
LandOfFree
Method and apparatus for measuring alignment of layers in... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for measuring alignment of layers in..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for measuring alignment of layers in... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2787676