Method and apparatus for measurement of crossfield chromatic...

Details Method and apparatus for measurement of crossfield chromatic... Method and apparatus for measurement of crossfield chromatic...

2005-11-14

2009-06-09

Young, Christopher G (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S312000, C430S328000, C356S515000, C356S521000

Reexamination Certificate

active

07544449

ABSTRACT:
A method and apparatus for measuring the chromatic response of lithographic projection imaging systems is described. An apparatus for determining the lens aberrations for a lithographic projection lens is provided. A substrate coated with a suitable recording media is provided. A series of lithographic exposures are performed using an exposure source with variable spectral settings. The exposures are measured, and the measurements are used to determine a chromatic response of the projection imaging system.

REFERENCES:
patent: 5828455 (1998-10-01), Smith et al.
patent: 5978085 (1999-11-01), Smith et al.
patent: 6356345 (2002-03-01), McArthur et al.
patent: 2005/0240895 (2005-10-01), Smith et al.

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