Active solid-state devices (e.g. – transistors – solid-state diode – Alignment marks
Reexamination Certificate
2011-01-25
2011-01-25
Pham, Thanh V (Department: 2894)
Active solid-state devices (e.g., transistors, solid-state diode
Alignment marks
C257S798000, C257SE21206
Reexamination Certificate
active
07875987
ABSTRACT:
A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction mirror arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.
REFERENCES:
patent: 6297876 (2001-10-01), Bornebroek
patent: 2003/0147082 (2003-08-01), Goldstein
patent: 2005/0225629 (2005-10-01), Kubota et al.
patent: 2005/0275814 (2005-12-01), Eib et al.
patent: 2008/0205820 (2008-08-01), Zheng et al.
patent: 101114134 (2008-01-01), None
patent: 0445871 (1991-09-01), None
patent: 1677158 (2006-07-01), None
patent: 04303914 (1992-10-01), None
Aguado Granados Axel
Fox Benjamin Aaron
Gibbs Nathaniel James
Maki Andrew Benson
Timpane Trevor Joseph
International Business Machines - Corporation
Pham Thanh V
Schmeiser Olsen & Watts
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