Active solid-state devices (e.g. – transistors – solid-state diode – Alignment marks
Reexamination Certificate
2011-08-02
2011-08-02
Pham, Thanh V (Department: 2894)
Active solid-state devices (e.g., transistors, solid-state diode
Alignment marks
C257SE31122, C257S114000, C356S509000, C438S008000, C438S975000
Reexamination Certificate
active
07989968
ABSTRACT:
A method, structure, system of aligning a substrate to a photomask. The method comprising: directing light through a clear region of the photomask in a photolithography tool, through a lens of the tool and onto a set of at least three diffraction mirror arrays on the substrate, each diffraction mirror array of the set of at least three diffraction mirror arrays comprising a single row of mirrors, all mirrors in any particular diffraction mirror array spaced apart a same distance, mirrors in different diffraction mirror arrays spaced apart different distances; measuring an intensity of light diffracted from the set of at least three diffraction mirror arrays onto an array of photo detectors; and adjusting a temperature of the photomask or photomask and lens based on the measured intensity of light.
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Notice of Allowance (Mail Date Sep. 16, 2010) for U.S. Appl. No. 11/861,380, filed Sep. 26, 2007; Confirmation No. 8301.
U.S. Appl. No. 12/888,600, filed Sep. 23, 2010.
Fox Benjamin A.
Gibbs Nathaniel J.
Granados Axel A.
Maki Andrew B.
Timpane Trevor J.
International Business Machines - Corporation
Pham Thanh V
Schmeiser Olsen & Watts
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