Semiconductor device manufacturing: process – Including control responsive to sensed condition – Optical characteristic sensed
Reexamination Certificate
2011-05-03
2011-05-03
Fourson, George (Department: 2823)
Semiconductor device manufacturing: process
Including control responsive to sensed condition
Optical characteristic sensed
C438S016000, C430S030000, C257SE21524
Reexamination Certificate
active
07935546
ABSTRACT:
A method, structure, system of aligning a substrate to a photomask. The method includes: directing incident light through a pattern of clear regions transparent to the incident light in an opaque-to-the-incident-light region of a photomask, through a lens and onto a photodiode formed in a substrate, the photodiodes electrically connected to a light emitting diode formed in the substrate, the light emitting diode emitting light of different wavelength than a wavelength of the incident lights; measuring an intensity of emitted light from light emitting diode; and adjusting alignment of the photomask to the substrate based on the measured intensity of emitted light.
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Aguado Granados Axel
Fox Benjamin Aaron
Gibbs Nathaniel James
Maki Andrew Benson
Sheets, II John Edward
Fourson George
International Business Machines - Corporation
Schmeiser Olsen & Watts
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