Method and apparatus for maskless photolithography

Photocopying – Projection printing and copying cameras – Illumination systems or details

Reexamination Certificate

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C355S077000, C430S022000

Reexamination Certificate

active

11398905

ABSTRACT:
A method and apparatus to create two dimensional and three dimensional structures using a maskless photolithography system that is semi-automated, directly reconfigurable, and does not require masks, templates or stencils to create each of the planes or layers on a multi layer two-dimensional or three dimensional structure. In an embodiment, the pattern generator comprises a micromirror array wherein the positioning of the mirrors in the micromirror array and the time duration of exposure can be modulated to produce gray scale patterns to photoform layers of continuously variable thickness. The desired pattern can be designed and stored using conventional computer aided drawing techniques and can be used to control the positioning of the individual mirrors in the micromirror array to reflect the corresponding desired pattern. A fixture for mounting of the substrate can be incorporated and can allow the substrate to be moved three dimensions. The fixture can be rotated in one, two, or three directions.

REFERENCES:
patent: 3925677 (1975-12-01), Fraser
patent: 4199688 (1980-04-01), Ozasa
patent: 5523193 (1996-06-01), Nelson
patent: 5585477 (1996-12-01), Kilpatrick
patent: 5661500 (1997-08-01), Shinoda et al.
patent: 5672464 (1997-09-01), Nelson
patent: 5691541 (1997-11-01), Ceglio et al.
patent: 5866913 (1999-02-01), Robinson
patent: 5870176 (1999-02-01), Sweatt et al.
patent: 5900637 (1999-05-01), Smith
patent: 6060224 (2000-05-01), Sweatt et al.
patent: 6177980 (2001-01-01), Johnson
patent: 6188519 (2001-02-01), Johnson
patent: 6238830 (2001-05-01), Rangarajan et al.
patent: 6238852 (2001-05-01), Klosner
patent: 6251550 (2001-06-01), Ishikawa
patent: 6379867 (2002-04-01), Mei et al.
patent: 6473237 (2002-10-01), Mei
patent: 6717650 (2004-04-01), Kain
patent: 6747783 (2004-06-01), Sandstrom
patent: 2002/0024714 (2002-02-01), Sandstrom et al.
patent: 2003/0048427 (2003-03-01), Fernandez et al.
patent: 2003/0084422 (2003-05-01), Chan
patent: 2003/0179352 (2003-09-01), Van Der Mast
patent: 0 971 387 (2000-01-01), None
patent: 1 033 741 (2000-09-01), None
patent: 57017132 (1982-01-01), None
patent: 63086432 (1986-09-01), None
patent: 63196038 (1988-08-01), None
patent: 03030415 (1991-02-01), None
patent: 03034312 (1991-02-01), None
patent: 03174716 (1991-07-01), None
patent: 04042533 (1992-02-01), None
patent: 04192422 (1992-07-01), None
patent: 05029205 (1993-02-01), None
patent: 05190517 (1993-07-01), None
patent: 07022303 (1993-07-01), None
patent: 05259045 (1993-08-01), None
patent: 0 045906 (1994-07-01), None
patent: 06216006 (1994-08-01), None
patent: 08045908 (1996-02-01), None
patent: WO-9804950 (1998-02-01), None
patent: WO-9938187 (1999-07-01), None
Singh-Gasson et al., “Maskless Fabrication of Light-Directed Oligonucleotide Microarrays Using a Digital Micromirror Array”, Nature Biotechnology, 1999, pp. 974-978, vol. 17.
Gibbs, “New Chip Off the Old Block”, Scientific American, Sep. 1996, online document, 3 pages.
Johnson, “Micromirror Arrays Perform Photolithography Step”, EETIMES, 1999, online document, 5 pages.
Mendoza et al., “High-Throughput Microarray-Based Enzyme-Linked Immunosorbent Assay (ELISA)”, Biotechniques, 1999, online document, 1 page.
Dobrowolski et al., “DNA Microarray Technology for Neonatal Screening”, Acta Paediatr Suppl, 1999, online document, 1 page.
Nuwaysir et al., “Microarrays and Toxicology: the Advent of Toxicogenomics”, Mol Carcinog, 1999, online document, 1 page.
Khan et al., “Expression Profiling in Cancer Using cDNA Microarrays”, Electrophoresis, 1999, online document, 1 page.
Epstein et al., “Microarray Technology—Enhanced Versatility”, Persistent Challenge, 2000, online document, 1 page.
Romero et al., “Reverse-Transcription Poylmerase Chain Reaction Detection of the Enteroviruses”, Arch Pathol Lab Med, 1999, online document, 1 page.
Sellwood et al., “The Use of Reverse Transcriptase-Polymerase Chain Reaction to Investigate Environmental Samples for the Presence of Enteroviruses”, Commun Dis Public Health, 1998, online document, 1 page.
Kurian et al., “DNA Chip Technology”, J Pathol, 1999, online document, 1 page.
Ren et al., “Fabrication of Y-Gate, Submicron Gate Length GaAs Metal-Semiconductor Field Effect Transistors”, Journal of Vacuum Science & Technology B, 1993, pp. 2603-2606, vol. 11, No. 6.
Martin et al., “Effects of Focused Ion Beam Reticle Repair on Optical Lithography at I-Line and Deep UltraViolet Wavelengths”, Journal of Vacuum Science & Technology B, 1993, pp. 427-431.
Leming Shi, “DNA Microarray (Genome Chip)”, website-www.GeneChips.com, 2002, 21 pages.
<http://www.envisiontec.de > www.envisiontec.de (Publication date on website is unknown.).
<http://www.micronic.se> www.micronic.se. Note that their micromirror technology is termed SLM technology (The link to this info is: http://www.micronic.se/site—eng/framesets/frame—products.html <http://www.micronic.se/site—eng/framesets/frame—products.html (Publication date on website in unknown.).
Lin et al., “An Improved Heterojunction-Emitter Bipolar Transistor Using Delta-Doped and Spacer Layers”, Materials Chemistry and Physics, 1999, pp. 91-95, vol. 59, No. 1 (Abstract Only).
Genolet et al., “Soft, Entirely Photoplastic Probes for Scanning Force Microscopy”, Review of Scientific Instruments, 1999, pp. 2398-2401, vol. 70, No. 5 (Abstract Only).
Sthel et al., “Testing a Furfuryl Alchohol Resin as a Negative Photoresist”, Polymer Testing, 1999, pp. 47-50, vol. 18, No. 1 (Abstract Only).
Karafyllidis et al., “Modelling and Simulation”, Microelectronic Engineering, 1999, pp. 71-84, vol. 45, No. 1 (Abstract Only).
Sekiguchi et al., “Influence of Underlayer Reflection on Optical Proximity Effects In Sub-Quarter Micron Lithography”, Proceedings of the SPIE- The International Society for Optical Engineering, 1998, pp. 347-355 vol. 3334 (Abstract Only).
Maeda et al., “ArF Chemically Amplified Negative Resist Using Alicyclic Epoxy Polymer”, Journal of Photopolymer Science and Technology, 1998, pp. 507-512, vol. 11, No. 3 (Abstract Only).
Kudo et al., “Optimization of DUV Negative Resists for 0.15 mu m Lithography”, Journal of Photopolymer Science and Technology, 1998, pp. 445-454 vol. 11, No. 1 (Abstract Only).
Wallraff et al., “Etch Selectivity of 4SiMA:hydroxystyrene based copolymers. Silicon Chemistry for Bilayer Resist Systems”, Journal of Photopolymer Science and Technology, 1998, pp. 673-679, vol. 11, No. 4 (Abstract Only).
Dabbagh et al., “Capabilities and Limitations of Plasma Polymerized Methylsilane (PPMS) All-Dry Lithography.”, Journal of Photopolymer Science and Technology, 1998, pp. 651-661, vol. 11, No. 4 (Abstract Only).
Karafyllidis et al., “Negative Resist Profiles in 248 nm Photolithography: Experiment, Modelling and Simulation”, Semiconductor Science and Technology, 1998, pp. 603-610, vol. 13, No. 6 (Abstract Only).
Robertson et al., “New Patternable Dielectric and Optical Materials for MCM-L/D- and o/e MCM-Packaging”, Proceedings. The First IEEE International Symposium on Polymeric Electronics Packaging, 1997, pp. 203-212, (Abstract Only).
Hauouel et al., “Dependence of Developed Negative Resist Profiles on Exposure Energy Dose: Experiment, Modeling, and Simulation”, Microelectronic Engineering, 1998, pp. 351-354, vol. 41-42 (Abstract Only).
Suzuki et al., “Proposal of Coplanar-type High-T/sub c/ Superconducting Field-effect Devices”, Physica C, 1997, pp. 2495-2496, vol. 282-287 (Abstract Only).
Inanami et al., “50 nm Pattern Etching of Si Wafer By Synchrotron Radiation Excited CF/sub 4/plasma”, Japanese Journal of Applied Physics, 1997, pp. 7706-7709, vol. 36, No. 12B (Abstract Only).
Yasuzato et al., “Optic

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