Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2007-07-10
2007-07-10
Wu, Jingge (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S112000, C358S003260, C356S239800
Reexamination Certificate
active
10455714
ABSTRACT:
The invention is directed to a method and apparatus for mapping defects on a light transmissive support surface of a document scanning or photocopying device. The method includes a step of cleaning the support surface between steps of operating the device so as to reflect light from defects associated with the support surface. At least a selected characteristic of the reflected light, such as its intensity, at predetermined pixel locations before the step of cleaning is compared with the same characteristic of the reflected light at the same pixel locations after the step of cleaning. A selected pixel location is mapped to a defect map if (1) the characteristic for reflected light is substantially equal for the selected pixel location at each step of operating the device, and (2) the characteristic for the reflected light at a step of operating the device substantially meets a predetermined standard.
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Chu Randolph I
Seiko Epson Corporation
Watson Mark P.
Wu Jingge
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