Coating apparatus – Gas or vapor deposition – With treating means
Patent
1995-08-15
1997-03-18
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
With treating means
118728, C23C 1600
Patent
active
056118627
ABSTRACT:
An apparatus and method for simultaneously coating a large number of cylindrical substrates employs plural pairs of power electrode and the ground electrodes connected with an independent power sources in order to promote the uniform coating of the substrates. The apparatus uses a high-frequency plasma chemical deposition method and comprises a power supply system, a gas supply system, and a vacuum system. These systems are operatively connected to a reactor. The reactor comprises plural electrodes, workpiece supports, insulators, annular ground electrodes, gas outlets and gas supply means. The method comprises a step for stacking the substrates or the workpiece supports and combining them with the electrodes, a step for introducing gas to the reactor, a step for applying power to the power electrodes, and a step or maintaining the pressure in the reactor constant.
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Eun Kwang-Yong
Lee Kwang-Ryeol
Breneman R. Bruce
Chang Joni
Korea Institute of Science and Technology
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