Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1999-07-22
2000-12-12
Hiteshew, Felisa
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
117 30, 117 32, 117917, C01B 3326
Patent
active
061594385
ABSTRACT:
In method for manufacturing a silicon single crystal in accordance with a Czochralski method, during the growth of the silicon single crystal, pulling is performed such that a solid-liquid interface in the crystal, excluding a peripheral 5 mm-width portion, exists within a range of an average vertical position of the solid-liquid interface.+-. 5 mm. There is also disclosed a method for manufacturing a silicon single crystal in accordance with the Czochralski method, wherein during the growth of a silicon single crystal, a furnace temperature is controlled such that a temperature gradient difference .DELTA.G (=Ge-Gc) is not greater than 5.degree. C./cm, where Ge is a temperature gradient (.degree. C./cm) at a peripheral portion of the crystal, and Gc is a temperature gradient (.degree. C./cm) at a central portion of the crystal, both in an in-crystal descending temperature zone between 1420.degree. C. and 1350.degree. C. or between a melting point of silicon and 1400.degree. C. in the vicinity of the solid-liquid interface of the crystal. The method maintains high productivity and enables a silicon single crystal and silicon wafers to be manufactured such that a defect density is very low over the entire crystal cross section, and the oxygen concentration distribution over the surface of each silicon wafer is improved.
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Iida Makoto
Iino Eiichi
Kimura Masanori
Muraoka Shozo
Yamanaka Hideki
Hiteshew Felisa
Shin-Etsu Handotai & Co., Ltd.
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