Method and apparatus for manufacturing a semiconductor device

Details Method and apparatus for manufacturing a semiconductor device Method and apparatus for manufacturing a semiconductor device

1992-08-03

1995-02-28

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

430311, 156626, 356355, 356357, 356381, 356444, G03C 500, H01L 21306, G01B 1102, G01N 2100

Patent

active

053936248

ABSTRACT:
A method of manufacturing a semiconductor device of this invention relates to a method of manufacturing a semiconductor device with ultra-micropattern electrodes. Light is projected on a resist film, and reflected light from a region on which no semiconductor chip is formed, i.e., a flat region is detected to measure the thickness of the resist film. Based on the measured thickness, at least one of the resist film forming step, the exposing step, and the developing step is controlled, so that the electrodes have a desired width.

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Elliott, David J. Integrated Circuit Fabrication Technology; McGraw-Hill Book Co., 1982 pp.-21, 112, 113, 145.

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