Method and apparatus for making plastic containers having decrea

Details Method and apparatus for making plastic containers having decrea Method and apparatus for making plastic containers having decrea

1985-10-29

1987-05-26

Page, Thurman K.

Coating apparatus

With vacuum or fluid pressure chamber

With means to apply electrical and/or radiant energy to work...

118623, 118624, 118627, 118640, 118720, 118721, 118723, 427 38, 427 40, 427 47, C23C 1400, C23C 1600, B05B 502, B05D 314

Patent

active

046676201

ABSTRACT:
Apparatus for producing open ended plastic containers having decreased gas permeability that includes a vacuum chamber and a pump for regulating the pressure therein, an ionization source mounted in the chamber proximate the container's open end and a container holder located in the chamber. The container holder has a hole aligned with the open end and may include a shield that encompasses the exterior of the container and may include a magnet setting up a magnetic field on the exterior of the shield. In the method, a container is placed on the container holder in the chamber with the open end and hole aligned and with the shield and magnet located as described above. The coating material is vaporized and ionized so that the ionized material is deposited on the interior wall of the container.

REFERENCES:
patent: 4401054 (1983-08-01), Matsuo et al.
patent: 4478874 (1984-10-01), Hahn
patent: 4481229 (1984-11-01), Suzuki et al.
patent: 4487162 (1984-12-01), Cann
patent: 4522844 (1985-06-01), Khanna et al.

Affiliated with

Also associated with

Rating

Method and apparatus for making plastic containers having decrea does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for making plastic containers having decrea, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for making plastic containers having decrea will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-696629