Method and apparatus for making ozone

Details Method and apparatus for making ozone Method and apparatus for making ozone

1981-12-21

1984-01-24

Padgett, Benjamin R.

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

With means applying electromagnetic wave energy or...

42218630, 2041571R, 204176, C01B 1300

Patent

active

044276362

ABSTRACT:
An apparatus and method is disclosed for manufacturing ozone by treating oxygen or an oxygen bearing gas with UV radiation in the range of from about 130-170 nm. The method involves the use of cathode rays to bombard a UV emitting material which emits radiation substantially in the 130-170 nm range. The invention takes advantage of the fact that no radiation is generated substantially above 200 nm or below 130 nm which wavelengths tend to destroy ozone. Thus, unlike the prior art, the present invention does not both make and destroy ozone, but simply makes ozone.

REFERENCES:
patent: 2683693 (1954-07-01), Celmer
patent: 3993911 (1976-11-01), Graentzel
patent: 4086152 (1980-04-01), Rich et al.
patent: 4095115 (1978-06-01), Orr, Jr. et al.
patent: 4124467 (1980-11-01), Pincon
patent: 4179616 (1979-12-01), Coviello et al.
patent: 4182663 (1980-01-01), Vaseen
patent: 4199419 (1980-04-01), Holroyd et al.
patent: 4214962 (1980-07-01), Pincon
patent: 4230571 (1980-10-01), Dadd
patent: 4317044 (1980-02-01), Vaseen
Rideal, E., 1920, Ozone, Constable and Company, Ltd., London, pp. 22-27, 70-73.
Kirk-Othmer, Encyclopedia of Chemical Technology, vol. 16, John Wiley and Sons, New York, pp. 688-691.

Affiliated with

Also associated with

Rating

Method and apparatus for making ozone does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for making ozone, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for making ozone will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1286945