Method and apparatus for making a predistorted reticle to compen

Details Method and apparatus for making a predistorted reticle to compen Method and apparatus for making a predistorted reticle to compen

1992-06-02

1994-05-03

Berman, Jack I.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

430 5, 355 52, 378 35, H01J 3730

Patent

active

053089910

ABSTRACT:
A method and apparatus for making predistorted masks or reticles which compensate for lens field errors for use in the fabrication of integrated circuit devices. The lens error is first expressed as distortion data. The data is used to produce correction terms which are applied to an interferometrically controlled stage which positions the mask or reticle beneath a writing tool. When the predistorted mask or reticle is used in conjunction with the lens for which the distortion data was obtained, an integrated circuit device is produced which does not incorporate the lens field errors.

REFERENCES:
patent: 4433384 (1984-02-01), Berrian et al.
patent: 4592081 (1986-05-01), Eaton et al.
patent: 4621371 (1986-11-01), Gotou et al.
patent: 5117255 (1992-05-01), Shiraishi et al.
patent: 5208124 (1993-05-01), Sporon et al.

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