Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal
Reexamination Certificate
2004-11-12
2009-02-03
Pham, Thanhha (Department: 2894)
Semiconductor device manufacturing: process
Making device or circuit responsive to nonelectrical signal
C438S045000, C438S052000, C438S053000, C438S735000, C257SE21002
Reexamination Certificate
active
07485485
ABSTRACT:
Devices are formed on a semiconductor wafer in an interdigitated relationship and are released by deep reactive ion etching. MEMS scanners are formed without a surrounding frame. Mounting pads extend outward from torsion arms. Neighboring MEMS scanners are formed with their mounting pads interdigitated such that a regular polygon cannot be formed around a device without also intersecting a portion of one or more neighboring devices. MEMS scanners may be held in their outlines by a metal layer, by small semiconductor bridges, or a combination.
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PCT International Search Report PCT/US2005/004065, Dec. 14, 2005.
Brown Dean R.
Davis Wyatt O.
Helsel Mark P.
Linden Kelly D.
Sprague Randall B.
Microvision Inc.
Pham Thanhha
Wills Kevin D.
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