Method and apparatus for making a mask conforming to a ceramic s

Details Method and apparatus for making a mask conforming to a ceramic s Method and apparatus for making a mask conforming to a ceramic s

1982-09-07

1984-10-02

Wintercorn, Richard A.

Photocopying

Contact printing

29760, 355125, 430312, G03B 2702

Patent

active

044744650

ABSTRACT:
This invention concerns method and apparatus for making a mask conforming to a cured MLC substrate. The mask when made may be used to add layers of metallization to the cured substrate by conventional photolithographic techniques. The method and apparatus feature use of the cured substrate itself to pattern the mask. Particularly, the substrate is aligned with the unpatterned mask and the image of the substrate transferred to the mask such that once patterned, the mask may subsequently be realigned with the substrate. In preferred form, a system of notches and grooves are used to align the substrate and mask and a lens system used to transfer the substrate image to the mask. The invention also includes method and apparatus for making an improved MLC substrate. The improvement is characterized by the use of photolithographic techniques to add successive layers of metallization to the cured substrate. This is accomplished by use of a special fixture for combining and aligning the cured substrate with a conforming mask.

REFERENCES:
patent: 3192844 (1965-07-01), Szasz et al.
patent: 3264105 (1966-08-01), Houtz, Jr.
patent: 3591284 (1971-07-01), Liebman
patent: 3685117 (1972-08-01), Wing et al.
patent: 3945827 (1976-03-01), Brown
patent: 4251318 (1981-02-01), Oberg et al.
patent: 4346987 (1982-08-01), Jalichandra et al.
patent: 4388386 (1983-06-01), King et al.
Newcomb et al., "Image Positioning", IBM Technical Disclosure Bulletin, vol. 15, No. 10, Mar. 1973, p. 3205.

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