Method and apparatus for maintaining sensitive articles in a con

Drying and gas or vapor contact with solids – Process – With nondrying treating of material

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34404, F26B 700

Patent

active

058159479

ABSTRACT:
Sensitive articles, such as IC wafers can be maintained in a contamination-free condition. A base member is provided for supporting one or more of the sensitive articles. A cover is provided for sealing engagement with a base member so as form a sealed unit. The sealed unit has an interior. The sealed unit is positioned at a storage position. A particle-free ionized gas is passed though the interior to bathe the articles supported therein with the gas at the storage position. The sealed unit is moved with the articles to an access position on associated processing equipment. The cover is removed from the base to expose the articles. The exposed articles are bathed continuously at the access position with a particle-free ionized gas. The articles are moved sequentially between the access position and a processing position on the associated processing equipment. The articles are bathed with a particle-free ionized gas during the moving steps. The cover is replaced on the base member so as to form the sealed unit and the sealed unit is returned with a processed wafer to the storage position.

REFERENCES:
patent: 5303482 (1994-04-01), Yamashita et al.
patent: 5320218 (1994-06-01), Yamashita et al.
patent: 5332013 (1994-07-01), Sugita et al.
patent: 5351415 (1994-10-01), Brooks et al.
patent: 5359785 (1994-11-01), Fukutomi et al.
patent: 5363867 (1994-11-01), Kawano et al.
patent: 5482161 (1996-01-01), Williams et al.

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