Abrading – Abrading process – Utilizing fluent abradant
Reexamination Certificate
2007-08-07
2007-08-07
Nguyen, Dung Van (Department: 3723)
Abrading
Abrading process
Utilizing fluent abradant
C451S050000, C451S057000
Reexamination Certificate
active
11358686
ABSTRACT:
A method of polishing workpieces in a magnetic float polishing chamber comprising a lower chamber piece and an upper chamber piece which is removably receivable in the lower chamber piece and is connected to a powered spindle for rotating the upper chamber piece in the polishing operation. The method preferably comprises one or more of the steps of (a) geometrically aligning the upper chamber piece with the powered spindle by machining the upper chamber piece in-situ, (b) machining the contact surface of the upper chamber piece in-situ between various polishing runs, and (c) mounting the lower chamber piece in a manner effective for causing the lower piece to automatically self-align coaxially with the upper chamber piece.
REFERENCES:
patent: 3660942 (1972-05-01), Messerschmidt
patent: 3695934 (1972-10-01), Feldhaus et al.
patent: 3984945 (1976-10-01), Messerschmidt
patent: 4010574 (1977-03-01), Feierabend et al.
patent: 4216629 (1980-08-01), DeGaeta
patent: 4306386 (1981-12-01), Sakulevich et al.
patent: 4821466 (1989-04-01), Kato et al.
patent: 4965967 (1990-10-01), London
patent: 5048238 (1991-09-01), Ikeda
patent: 5070658 (1991-12-01), Rajner et al.
patent: 5185957 (1993-02-01), Mizuguchi et al.
patent: 5214884 (1993-06-01), Kinoshita et al.
patent: 5384989 (1995-01-01), Shibano
patent: 5449313 (1995-09-01), Kordonsky et al.
patent: 5460566 (1995-10-01), Trahan
patent: 5575706 (1996-11-01), Tsai et al.
patent: 5577948 (1996-11-01), Kordonsky et al.
patent: 5578238 (1996-11-01), Weiss et al.
patent: 5931718 (1999-08-01), Komanduri et al.
patent: 5957753 (1999-09-01), Komanduri et al.
patent: 6171179 (2001-01-01), Chiou et al.
patent: WO 95/20465 (1995-08-01), None
patent: WO 99/47304 (1999-09-01), None
Bhagavatula, et al., On Chemomechanical Polishing of SI3N4 With CR203,Philosophical Magazine, 1996, Publisher: 1996 Taylor & Francis Ltd., vol. 74, No. 4, p. 1003-1017.
Childs, et al., Magnetic Fluid Grinding of Ceramic Balls,Tribology International, 1995, Publisher: 1995 Elsevier Science Ltd., vol. 28, No. 6, 00. p. 341-348.
Childs, et al., Magnetic Fluid Grinding Cell Design, 1992, Publisher: 1992 CIRP Annals.
Fox, et al., Magnetic Abrasive Finishing of Rollers, 1994, Publisher: 1994CIRP Annals, vol. 43/1.
Komanduri, et al., On the Possibilty of Chemomechanical Action in Magnetic Float Polishing of Silicon Nitride, 1996, Publisher: 1996Journal of Tribology, vol. 118, p. 721-727.
Raghunadan, et al., Magnetic Float Polishing of Ceramics,Journal of Manufacturing Science and Engineering, 1997, Publisher: 1997 ASME: J Manufacturing, vol. 119, p. 001-009.
Umehara, et al., Magnetic Fluid Grinding of HIP-SI3N4 Rollers, 1995, Publisher: 1995 Elsevier Science S.A.,Wear, 00, p. 1-8.
Umehara, et al., Principles of Magnetic Fluid Grinding of Ceramic Balls,Applied Electromagnetics in Materials, 1990, Publisher: 1990 Elsevier Science Publishers, p. 37-43.
Murkov, Abrasive Polishing Machine, 1983, Publisher: Derwent Publications Ltd.
Patent Abstracts of Japan JP 59 014461 Published Jan. 25, 1984.
Patent Abstracts of Japan JP 08257897, Published Oct. 8, 1996.
Patent Abstracts of Japan JP 02009567, Published Jan. 12, 1990.
Gerlick Robert Edward
Jain Vijay Kumar
Kirtane Tejas Shrikant
Komanduri Ranga
Umehara Noritsugu
Fellers, Snider, Blankenship, Bailey & Tippens
Nguyen Dung Van
The Board of Regents for Oklahoma State University
LandOfFree
Method and apparatus for magnetic float polishing does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for magnetic float polishing, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for magnetic float polishing will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3847918