Method and apparatus for lubricating conductive substrates

Details Method and apparatus for lubricating conductive substrates Method and apparatus for lubricating conductive substrates

1980-09-18

1982-06-22

Beck, Shrive P.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 33, 427209, 48627, 48630, 48635, B05D 104, B05B 500

Patent

active

043362753

ABSTRACT:
Method and apparatus are disclosed for electrostatically dispersing lubricating particles onto the surfaces of electrically conductive substrates. In the method and apparatus, discrete sheets, for example, of electrically conductive substrate are moved through a housing in which the lubricating particles are deposited. The conveying means that carry the sheets through the housing electrically isolate the sheets in space while they are exposed to deposition of the particles. To avoid the accumulation of voltage on the sheets during deposition and to avoid inhibition of deposition that may result therefrom, at least two deposition chambers are used and each deposition chamber receives a supply of lubricating particles for deposition on the sheets. Independent electrode means are provided in each deposition chamber. Voltages of opposite polarities are applied to the independent electrode means of each deposition chamber to electrically charge the particles in each deposition chamber with opposite polarities and to deposit oppositely charged particles on the sheets.

REFERENCES:
patent: 3323934 (1967-06-01), Point
patent: 3380845 (1968-04-01), Shapiro et al.
patent: 4073966 (1978-02-01), Scholes

Affiliated with

Also associated with

Rating

Method and apparatus for lubricating conductive substrates does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for lubricating conductive substrates, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for lubricating conductive substrates will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-653053