Method and apparatus for low pressure plasma

Details Method and apparatus for low pressure plasma Method and apparatus for low pressure plasma

1988-11-04

1990-08-21

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118692, 156627, 156345, C23C 1650

Patent

active

049496700

ABSTRACT:
In a magnetically confined plasma, optimal pressure is found by measuring the peak to peak voltage of the plasma and looking for a distinct minimum in the peak to peak voltage. The pressure at which the minimum occurs can be used to calibrate a manometer used in the system.

REFERENCES:
patent: 4609426 (1986-09-01), Ogawa

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