Method and apparatus for low-energy scanning electron beam litho

Details Method and apparatus for low-energy scanning electron beam litho Method and apparatus for low-energy scanning electron beam litho

1988-02-19

1988-11-15

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

2504923, 250423F, H01J 37317

Patent

active

047851899

ABSTRACT:
An electron sensitive surface is patternized treated to a high resolution pattern of low-energy electrons without any need to do focussing by emitting the low-energy electrons from a pointed electrode and positioning the apex of the pointed electron emitting source suitably close to the surface being treated.

REFERENCES:
patent: 4343993 (1982-08-01), Bennig et al.
patent: 4550257 (1985-10-01), Bennig et al.
Bennig et al., "Surface Studies by Scanning Electron Microscopy," Rev. Phys. Lett., vol. 49, pp. 57-61, (1982).
Bennig et al., "Tunneling Through a Controllable Vacuum Gap," Appl. Phys. Lett., vol. 40, pp. 178-180, (1982).
Young, R. D., "Field Emission Ultramicrometer," Rev. Sci. Inst., vol. 37, pp. 275-278, (1966).

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