Method and apparatus for localized liquid treatment of the...

Cleaning and liquid contact with solids – Apparatus – With plural means for supplying or applying different fluids...

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C134S002000, C134S032000, C134S033000, C156S345110, C156S345170, C156S345180

Reexamination Certificate

active

06851435

ABSTRACT:
A method and apparatus for dispensing a liquid on the surface of a localized zone of a substrate, for example for cleaning of etching purposes. Along with the liquid, a gaseous tensio-active substance is supplied, which is miscible with said liquid and when mixed with the liquid, reduces the surface tension of said liquid, thus containing the liquid in a local zone of the substrate surface.

REFERENCES:
patent: 4838289 (1989-06-01), Kottman et al.
patent: 5271774 (1993-12-01), Leenaars et al.
patent: 5660642 (1997-08-01), Britten
patent: 5705223 (1998-01-01), Bunkofske
patent: 5749413 (1998-05-01), Crowe
patent: 5873380 (1999-02-01), Kanno
patent: 5887605 (1999-03-01), Lee et al.
patent: 5945351 (1999-08-01), Mathuni
patent: 5964952 (1999-10-01), Kunze-Concewitz
patent: 5997653 (1999-12-01), Yamasaka
patent: 6334902 (2002-01-01), Mertens et al.
patent: 02280330 (1990-11-01), None
patent: 02309638 (1990-12-01), None
patent: 7-211686 (1995-07-01), None
patent: 11350169 (1999-12-01), None
European Patent Office Search Report, Application No EP 00 87 0135.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for localized liquid treatment of the... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for localized liquid treatment of the..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for localized liquid treatment of the... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3491525

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.