Method and apparatus for local fluorine and nitrogen...

Details Method and apparatus for local fluorine and nitrogen... Method and apparatus for local fluorine and nitrogen...

2008-07-08

2008-07-08

Webb, Gregory (Department: 1796)

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

C134S022100, C423S210000, C423S406000, C423S489000

Reexamination Certificate

active

11098694

ABSTRACT:
The present invention relates to a process for production, shipment, and treatment of a NH4F(HF)xfeedstock for local production of fluorine and NF3for semiconductor chamber cleaning without the need for storage of large quantities of dangerous feeds and intermediate products.

REFERENCES:
patent: 4091081 (1978-05-01), Woytek et al.
patent: 5637282 (1997-06-01), Osborne et al.
patent: 5637285 (1997-06-01), Coronell et al.
patent: 6843258 (2005-01-01), Shang et al.
patent: 6986874 (2006-01-01), Satchell et al.

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