Method and apparatus for loading objects into evacuated treating

Material or article handling – Apparatus for moving material between zones having different... – For carrying standarized mechanical interface type

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414331, 432 10, 432223, H01L 2130

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active

049446452

ABSTRACT:
In a method and apparatus for depicting a circuit pattern on an article such as a semiconductor wafer, glass mask or a reticle supported by a stage in an evacuated casing with an electron beam, the article is disposed in a magazine contained in a sealable chamber communicated with the evacuated chamber. The article is contacted with a heat adjusting member to adjust the temperature thereof. After matching the level of the article with that of the stage, the article is loaded on the stage.

REFERENCES:
patent: 3407097 (1968-10-01), Engelhard
patent: 3521765 (1970-07-01), Kasuffman et al.
patent: 3656454 (1972-04-01), Schroder
patent: 3756067 (1973-09-01), Cushman
patent: 4487675 (1984-12-01), Meckel
patent: 4498833 (1985-02-01), Hertel
patent: 4506455 (1985-03-01), Rossi
patent: 4529869 (1985-07-01), Ekstrom, Jr.
patent: 4565601 (1986-01-01), Kakehi et al.
patent: 4664578 (1987-05-01), Kakehi
IEEE Transactions on Electron Devices, vol. ED-16, No. 9, Sep. 1979, pp. 1299-1305, Yau, Leopoldo D., "Process-Induced Distortion in Silicon Wafers".

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