Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
Reexamination Certificate
2006-04-04
2011-11-01
Decady, Albert (Department: 2121)
Data processing: generic control systems or specific application
Specific application, apparatus or process
Product assembly or manufacturing
C438S014000, C382S144000, C707S600000, C707S609000, C702S108000
Reexamination Certificate
active
08050793
ABSTRACT:
A method includes providing a design data file specifying at least one target feature on a first reticle. A reticle qualification data file specifying a plurality of feature measurements associated with features formed using the first reticle is provided. At least one of the feature measurements is linked to the target feature on the first reticle. The target feature and the linked feature measurement are stored in a data store.
REFERENCES:
patent: 5625816 (1997-04-01), Burdick et al.
patent: 5889674 (1999-03-01), Burdick et al.
patent: 6148307 (2000-11-01), Burdick et al.
patent: 6240331 (2001-05-01), Yun
patent: 6301701 (2001-10-01), Walker et al.
patent: 6599670 (2003-07-01), Ikuno et al.
patent: 6606582 (2003-08-01), Brinkman et al.
patent: 6744266 (2004-06-01), Dor et al.
patent: 6759655 (2004-07-01), Nara et al.
patent: 6801297 (2004-10-01), Nakae
patent: 6826735 (2004-11-01), Ono et al.
patent: 6841321 (2005-01-01), Matsumoto et al.
patent: 6842230 (2005-01-01), Takakuwa et al.
patent: 6928384 (2005-08-01), Kochi
patent: 6982136 (2006-01-01), Haidinyak
patent: 7058627 (2006-06-01), Wiesler et al.
patent: 7061600 (2006-06-01), Maeda et al.
patent: 7117470 (2006-10-01), Teig et al.
patent: 7194328 (2007-03-01), Haskins et al.
patent: 7206652 (2007-04-01), Burda et al.
patent: 7295304 (2007-11-01), Yamaguchi et al.
patent: 7718912 (2010-05-01), Akimoto
patent: 2001/0047222 (2001-11-01), Wiesler et al.
patent: 2002/0078427 (2002-06-01), Palmer et al.
patent: 2002/0081501 (2002-06-01), Hasegawa et al.
patent: 2003/0061212 (2003-03-01), Smith et al.
patent: 2003/0066035 (2003-04-01), Nagamura
patent: 2003/0126581 (2003-07-01), Pang et al.
patent: 2003/0130806 (2003-07-01), Mizuno et al.
patent: 2003/0161525 (2003-08-01), Bruce et al.
patent: 2003/0200523 (2003-10-01), Takahashi et al.
patent: 2003/0228532 (2003-12-01), Mui et al.
patent: 2004/0075837 (2004-04-01), Maeda et al.
patent: 2004/0115541 (2004-06-01), Yamaguchi et al.
patent: 2004/0144928 (2004-07-01), Abe et al.
patent: 2004/0165761 (2004-08-01), Hung et al.
patent: 2004/0181458 (2004-09-01), Kochpatcharin et al.
patent: 2004/0181769 (2004-09-01), Kochpatcharin et al.
patent: 2004/0182822 (2004-09-01), Chen et al.
patent: 2004/0197674 (2004-10-01), Bailey et al.
patent: 2004/0204838 (2004-10-01), Chen et al.
patent: 2005/0002554 (2005-01-01), Schulze et al.
patent: 2005/0004774 (2005-01-01), Volk et al.
patent: 2005/0015739 (2005-01-01), Scheffer et al.
patent: 2005/0144072 (2005-06-01), Perkowski et al.
patent: 2005/0166171 (2005-07-01), Bartov
patent: 2005/0220332 (2005-10-01), Akutagawa et al.
patent: 2005/0278597 (2005-12-01), Miguelanez et al.
patent: 2006/0010416 (2006-01-01), Keck et al.
patent: 2006/0036979 (2006-02-01), Zurbrick et al.
patent: 2006/0053219 (2006-03-01), Kutsumi et al.
patent: 2006/0240336 (2006-10-01), Watson et al.
patent: 2007/0288219 (2007-12-01), Zafar et al.
patent: 2008/0081385 (2008-04-01), Marella et al.
patent: 2001/006997 (2001-01-01), None
Nobuyuki Iriki, JEITA's Standardization Effort on Reticle Data Management, e-Manufacturing Workshop, Dec. 3, 2002.
Pindo, Photomask specifications for high energy physics detectors, 2001.
Haskins Andrew
Xia Chunliang
Advanced Micro Devices , Inc.
De'cady Albert
Dunn Darrin
Williams Morgan & Amerson P.C.
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